The antenna effect, more formally plasma induced gate oxide damage, is an effect that can potentially cause yield and reliability problems during the manufacture of MOS integrated circuits. Factories (fabs) normally supply antenna rules, which are rules that must be obeyed to avoid this problem.
The antenna effect, more formally plasma induced gate oxide damage, is an effect that can potentially cause yield and reliability problems during the manufacture of MOS integrated circuits. Factories (fabs) normally supply antenna rules, which are rules that must be obeyed to avoid this problem.
Source: Wikipedia "Antenna effect" · CC BY-SA 4.0
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