Extreme ultraviolet lithography

Extreme ultraviolet lithography (EUVL or simply EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

Source: Wikipedia — Extreme ultraviolet lithography (CC BY-SA 4.0)