Magnetolithography (ML) is a photoresist-less and photomaskless lithography method for patterning wafer surfaces. ML is based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic masks" placed on either topside or backside of the wafer.
Magnetolithography (ML) is a photoresist-less and photomaskless lithography method for patterning wafer surfaces. ML is based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic masks" placed on either topside or backside of the wafer.
Source: Wikipedia "Magnetolithography" · CC BY-SA 4.0
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